| Title: | A BASIC program for calculating dopant density profiles from capacitance-voltage data |
| Author: | Mattis, Richard L. |
| Author: | Buehler, Martin G. |
| Author: | United States. National Bureau of Standards |
| Note: | U.S. Dept. of Commerce, National Bureau of Standards :, 1975 |
| Link: | page images at HathiTrust |
| No stable link: | This is an uncurated book entry from our extended bookshelves, readable online now but without a stable link here. You should not bookmark this page, but you can request that we add this book to our curated collection, which has stable links. |
| Subject: | BASIC (Computer program language) |
| Subject: | Diodes à semiconducteur -- Informatique |
| Subject: | Diodes, Semiconductor -- Data processing |
| Subject: | Electric measurements -- Data processing |
| Subject: | Ion implantation -- Data processing |
| Subject: | Ions -- Implantation -- Informatique |
| Subject: | Mesures électriques -- Informatique |
| Other copies: | Look for editions of this book at your library, or elsewhere. |
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