| Title: | Development of a polysilicon process based on chemical vapor deposition (phase 1) : second quarterly progress report, January 1-March 31, 1980 |
| Author: | Hemlock Semiconductor Corporation |
| Author: | Sawyer, D. |
| Author: | Plahutnik, F. |
| Author: | Arvidson, A. |
| Author: | Sharp, K. |
| Author: | United States. Department of Energy. Division of Solar Energy |
| Author: | Jet Propulsion Laboratory (U.S.) |
| Note: | Washington, D.C. : U.S. Department of Energy, Solar Energy, 1980., 1980 |
| Link: | page images at HathiTrust |
| No stable link: | This is an uncurated book entry from our extended bookshelves, readable online now but without a stable link here. You should not bookmark this page, but you can request that we add this book to our curated collection, which has stable links. |
| Subject: | Chemical processes |
| Subject: | Chemical vapor deposition -- United States |
| Subject: | Silicon -- Industrial applications -- United States |
| Other copies: | Look for editions of this book at your library, or elsewhere. |
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