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Metal organic chemical vapor deposition

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• Chemical vapor deposition

• Metallorganic vapor phase epitaxy
• Metal organic vapor phase epitaxy
• MOCVD (Vapor deposition)
• MOVPE (Vapor deposition)
• OMCVD (Vapor deposition)
• OMVPE (Vapor deposition)
• Organometallic chemical vapor deposition
• Organometallic vapor phase epitaxy
• Organo-metal vapor phase epitaxy

• Vapor phase chlorination of uranium oxides (Atomic Energy Commission, 1947), by H. A. Young, H. G. Reiber, University of California, and U.S. Atomic Energy Commission. Technical Information Division (page images at HathiTrust)

Items below (if any) are from related and broader terms.

• Growth of high-quality thin-film Ge single crystals by plasma-enhanced chemical vapor deposition (National Aeronautics and Space Administration, Scientific and Technical Information Branch ;, 1986), by R. A. Outlaw, P. Hopson, and Langley Research Center (page images at HathiTrust)
• Vapor phase growth system and its use in the preparation of several III-V compound semiconductors (National Aeronautics and Space Administration ;, 1971), by Ronald E. Enstrom, A. G. Sigai, E. A. Miller, United States National Aeronautics and Space Administration, and RCA Laboratories (page images at HathiTrust)
• Carbide coated fibers in graphite-aluminum composites : progress report (National Aeronautics and Space Administration ;, 1975), by Richard J. Imprescia, Langley Research Center, and Los Alamos Scientific Laboratory (page images at HathiTrust)
• In-space fabrication of thin-film structures (National Aeronautics and Space Administration ;, 1972), by M. E. Lippman, United States National Aeronautics and Space Administration, and Astro Research Corporation (page images at HathiTrust)
• Vapor-deposited thin gold films as lubricants in vacuum (10⁻¹¹ mm Hg) (National Aeronautics and Space Administration ;, 1965), by Talivaldis Spalvins, Donald H. Buckley, and Lewis Research Center (page images at HathiTrust)
• Fluidized-bed coating of UO₂ powder with niobium and other elements (Battelle Memorial Institute, 1960), by Erlan E. Rose, Virginia M. Secrest, Jospeh H. Oxley, Neil D. Veigel, J. M. Blocher, U.S. Atomic Energy Commission, and Battelle Memorial Institute (page images at HathiTrust)
• Molecular forming techniques (Wright-Patterson Air Force Base, Ohio : Fabrication Branch, Manufacturing Technology Laboratory, Directorate of Materials and Processes, Aeronautical Systems Division, Air Force Systems Command, [1962], 1962), by Julian Glasser, William E. Few, United States. Air Force. Systems Command. Aeronautical Systems Division, Inc Chemical and Metallurgical Research, and Ohio State University. Research Foundation (page images at HathiTrust)
• Development of a method to accomplish Aluminum deposition by gas plating (Wright-Patterson Air Force Base, Ohio : Wright Air Development Center, Air Research and Development Command, United States Air Force, 1959., 1959), by Malvern J. Hiler, William C. Jenkin, Wright Air Development Center, and United States. Air Force. Air Research and Development Command (page images at HathiTrust)

• Development of a polysilicon process based on chemical vapor deposition (phase 1) : second quarterly progress report, January 1-March 31, 1980 (Washington, D.C. : U.S. Department of Energy, Solar Energy, 1980., 1980), by Hemlock Semiconductor Corporation, D. Sawyer, F. Plahutnik, A. Arvidson, K. Sharp, United States. Department of Energy. Division of Solar Energy, and Jet Propulsion Laboratory (U.S.) (page images at HathiTrust)
• Development of a polysilicon process based on chemical vapor deposition (phase 1) : forth quarterly progress report for July 1-September 30, 1980 (Washington, D.C. : U.S. Department of Energy, Solar Energy, 1980., 1980), by Hemlock Semiconductor Corporation, D. Sawyer, A. Arvidson, K. Sharp, United States. Department of Energy. Division of Solar Energy, and Jet Propulsion Laboratory (U.S.) (page images at HathiTrust)
• Development of a polysilicon process based on chemical vapor deposition (phase 1) : third quarterly progress report, April 1-June 30, 1980 (Washington, D.C. : U.S. Department of Energy, Solar Energy, 1980., 1980), by Hemlock Semiconductor Corporation, D. Sawyer, F. Plahutnik, A. Arvidson, K. Sharp, Low-Cost Silicon Solar Array Project (U.S.), Jet Propulsion Laboratory (U.S.), and United States. Department of Energy. Division of Solar Energy (page images at HathiTrust)

• Numerical modeling tools for chemical vapor deposition (National Aeronautics and Space Administration, Office of Management, Scientific and Technical Information Program ;, 1992), by Thomas John Jasinski, Edwards P. Childs, United States. National Aeronautics and Space Administration. Scientific and Technical Information Program, and Langley Research Center (page images at HathiTrust)

• Beam Technologies for Integrated Processing (1992), by National Research Council National Materials Advisory Board (page images with commentary at NAP)